PART/1CVD (Chemical Vapor Deposition) tikanga:I te 900-2300 ℃, te whakamahi i te TaCl5 me te CnHm hei puna tantalum me te waro, H₂ hei whakaheke i te hau, Ar₂as kaikawe hau, kiriata waipara tauhohenga. Ko te paninga kua oti te whakarite he paku, he rite me te tino ma. Heoi ano, tera ano etahi raru ...
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